Nanomagnet fabrication using nanoimprint lithography and electrodeposition
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We present a novel fabrication process for the growth of metal nanostructures that combines nanoimprint lithography and electrodeposition, both of which are suitable for large-scale industrial fabrication. Gold nanostructures fabricated by nanoimprint lithography on a highly doped, p-type, Si wafer act as a seed layer for metal electrodeposition. This novel process has wide applications in nanomagnet logic and surface-enhanced electrochemistry. We fabricate magnetic nanowires and nanodots using this process. The resulting nanostructures are analyzed with atomic force microscopy and scanning electron microscopy, the composition of the electrodeposited nanostructures are analyzed by energy-dispersive X-ray spectroscopy, and the magnetic properties are measured with magnetic force microscopy. © 2002-2012 IEEE.
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Scarpa G; Abdellah A; Exner A; Harrer S; Blanco GP; Wiedemann W; Schmidt-Mende L; Lugli P (IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 2011)We use thermal and room temperature nanoimprint lithography (NIL) for directly patterning the photoactive polymer poly(3-hexylthiophene-2,5-diyl) (P3HT) in the sub-50-nm region. Different types of molds were used to directly ...
Scarpa G; Harrer S; Abdellah A; Penso-Blanco G; Lugli P; Strobel S; Abstreiter G; Tornow M (IEEE, 2009)Nanofabrication is the core task performed and constantly further developed by todays and future semiconductor industry. Optimization of throughput and minimizing process cost and complexity thus increasing fabrication ...
Lugli P; Nagel R; Filser S; Zhang T; Manzi A; Schönleber K; Lindsly J; Zimmermann J; Maier T; Scarpa G; Krischer K (American Institute of Physics Inc., 2017)In this article, we present a refined nanostructuring method, lift-off nanoimprint lithography (LO-NIL), which allows the deposition of high-quality metal nanostructures due to a bilayer resist process and compare it to ...