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dc.contributor.authorImtaar M
dc.contributor.authorLi P
dc.contributor.authorVarga E
dc.contributor.authorCsaba G
dc.contributor.authorBernstein G
dc.contributor.authorScarpa G
dc.contributor.authorPorod W
dc.contributor.authorLugli P
dc.contributor.editor
dc.date.accessioned2017-11-21T10:47:48Z
dc.date.available2017-11-21T10:47:48Z
dc.date.issued2013
dc.identifier.isbn978-1-4799-0675-8
dc.identifier.issn1944-9399
dc.identifier.urihttp://dx.doi.org/10.1109/NANO.2013.6720988
dc.identifier.urihttp://ieeexplore.ieee.org/abstract/document/6720988/?reload=true
dc.identifier.urihttp://hdl.handle.net/10863/4059
dc.description.abstractWe present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method. © 2013 IEEE.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.rights
dc.titleNanomagnetic logic devices fabrication using nanoimprint lithographyen_US
dc.typeBook chapteren_US
dc.date.updated2017-07-31T10:23:04Z
dc.publication.title2013 IEEE 13th International Conference on Nanotechnology (IEEE-NANO 2013): Beijing, China, 5 - 8 August 2013
dc.language.isiEN-GB
dc.journal.titleProceedings of the ... IEEE Conference on Nanotechnology
dc.description.fulltextreserveden_US


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