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dc.contributor.authorFakhr O
dc.contributor.authorAltpeter P
dc.contributor.authorKarrai K
dc.contributor.authorLugli P
dc.contributor.editor
dc.date.accessioned2017-11-16T10:21:20Z
dc.date.available2017-11-16T10:21:20Z
dc.date.issued2011
dc.identifier.issn1613-6810
dc.identifier.urihttp://dx.doi.org/10.1002/smll.201100413
dc.identifier.urihttp://onlinelibrary.wiley.com/doi/10.1002/smll.201100413/full
dc.identifier.urihttp://hdl.handle.net/10863/3859
dc.description.abstractAn easy and cost-effective method to reproducibly fabricate nanogaps over a large area is introduced. Gold is evaporated on low-aspect-ratio polydimethylsiloxane (PDMS) stamps at an angle of 60°. Afterwards, the stamp is brought into contact with a silicon/silicon dioxide substrate and subsequently peeled at rates varying from 1 to 3 mm s , resulting in the fabrication of nanogaps between two gold electrodes. The fabrication of insulating nanogaps with a width down to 50 nm is demonstrated. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.en_US
dc.language.isoenen_US
dc.rights
dc.subjectSoft lithographyen_US
dc.subjectTransfer printingen_US
dc.subjectNanopatterningen_US
dc.subjectNanogap electrodesen_US
dc.titleEasy fabrication of electrically insulating nanogaps by transfer printingen_US
dc.typeArticleen_US
dc.date.updated2017-07-31T10:11:46Z
dc.publication.title
dc.language.isiEN-GB
dc.journal.titleSmall
dc.description.fulltextreserveden_US


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