Patterning Poly (3-Hexylthiophene) in the Sub-50-nm Region by Nanoimprint Lithography
MetadataShow full item record
SubjectOrganic semiconductors; Organic photovoltaic devices (OPVs); Nanostructuring; Nanoimprint lithography (NIL); Poly(3-hexylthiophene-2
We use thermal and room temperature nanoimprint lithography (NIL) for directly patterning the photoactive polymer poly(3-hexylthiophene-2,5-diyl) (P3HT) in the sub-50-nm region. Different types of molds were used to directly imprint the desired structures into P3HT thin films. Good pattern transfer is achieved independent of the presence of other underlying polymer layers or the type of substrate incorporated. Further, we discuss the future application of this technology to the fabrication of ordered hetero-juction organic photovoltaic devices and demonstrate that the NIL process involved does not damage the polymer or alter its chemical or electrical properties.
Showing items related by title, author, creator and subject.
Wiedenmann O; Abdellah A; Scarpa G; Lugli P (2009)A theoretical analysis based on a drift-diffusion simulation method is performed for investigating device performances of nanostructured organic solar cells. The results show an increase of the short-circuit current density, ...
Imtaar M; Li P; Varga E; Csaba G; Bernstein G; Scarpa G; Porod W; Lugli P (IEEE, 2013)We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer ...
Imtaar M; Yadav A; Epping A; Becherer M; Fabel B; Rezgani J; Csaba G; Bernstein G; Scarpa G; Porod W; Lugli P (2013)We present a novel fabrication process for the growth of metal nanostructures that combines nanoimprint lithography and electrodeposition, both of which are suitable for large-scale industrial fabrication. Gold nanostructures ...