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    • Patterning Poly (3-Hexylthiophene) in the Sub-50-nm Region by Nanoimprint Lithography 

      Scarpa G; Abdellah A; Exner A; Harrer S; Blanco GP; Wiedemann W; Schmidt-Mende L; Lugli P (IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 2011)
      We use thermal and room temperature nanoimprint lithography (NIL) for directly patterning the photoactive polymer poly(3-hexylthiophene-2,5-diyl) (P3HT) in the sub-50-nm region. Different types of molds were used to directly ...