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Nanomagnetic logic devices fabrication using nanoimprint lithography
Conference proceeding   Peer reviewed

Nanomagnetic logic devices fabrication using nanoimprint lithography

M Imtaar, P Li, E Varga, G Csaba, G Bernstein, G Scarpa, W Porod and Paolo Lugli
2013 IEEE 13th International Conference on Nanotechnology (IEEE-NANO 2013): Beijing, China, 5 - 8 August 2013, pp.578-581
2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013) (Beijing, 05/08/2013 - 08/08/2013)
2013
DOI: https://doi.org/10.1109/NANO.2013.6720988
Handle:
https://hdl.handle.net/10863/4059

Abstract

Sensors
We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method. © 2013 IEEE.
url
http://ieeexplore.ieee.org/abstract/document/6720988/?reload=trueView

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